We offer you,
a new insight
High precision sensing solutions by Optical Interference Contactless Thermomety (OICT).
What’s New
Don’t you have troubles in temperature measurements?
for instance,
Cannot measure the temperature of products during processing
Calibration has been done by thermocouple, but,
Are you sure indirect measurement is really reliable?
Cannot estimate process induced temperature variation
Cannot clarify the surface temperature variation induced by plasma, rapid annealing, polishing, and wet process.
Are you sure indirect measurement is really reliable?
Cannot manage the temperature history of each product
Don’t know how to manage yield and unexpected temperature problems.
Are you sure indirect measurement is really reliable?
OICT is the solution
You can measure the products temperature with non-contact method
OICT measures the temperature of the product directly, you will find varying temperature in detail during processing.
OICT offers real-time measurement
You will have improved traceability and yield, quick countermeasure against troubles.
Fast and precise
OICT measures quick temperature change with millisecond time resolution and 0.1℃ temperature resolution.
– Expected use cases –
Correct and repeatable temperature measurement needed for material and process developments.
Replacement of conventional contact-type temperature measurements and radiation thermometer.
Temperature variation in individual equipment can be suppressed by the introduction of OICT as the calibration standard.
To monitor the temperatures of glass and plastic substrates.
OICT – enabler of temperature visualization
Principle of OICT
The reflectivity of laser light changes in accordance with the variation of temperature due to multiple reflection and interference inside the sample.
Known relationship between refractive index and temperature (thermo optic coefficient) gives us the temperature of the sample itself.
(b)extracted temperature distributions in the sample］
T. Okada, S. Higashi, H. Kaku, H. Murakami, and S. Miyazaki, “Analysis of Transient Temperature Profile During Thermal Plasma Jet Annealing of Si Films on Quartz Substrate,” Jpn. J. Appl. Phys., 45 (2006) 4355.
T. Okada, S. Higashi, H. Kaku, N. Koba, H. Murakami, and S. Miyazaki, “Control of substrate surface temperature in millisecond annealing technique using thermal plasma jet,” Thin Solid Films, 515 (2007) 4897. A. Kameda, Y. Mizukawa, H. Hanafusa, and S. Higashi, “Precise measurement of the temperature of a silicon wafer by an optical-interference contactless thermometer during rapid plasma processing,” J. Appl. Phys., 127 (2020) 203302-1.
Company outline
| Company name | OICT Co., Ltd. |
|---|---|
| Established | July 29, 2024 |
| President | Seiichiro Higashi |
| Description of business | Sales and production of measurement instruments and semiconductor manufacturing equipment. |
| Location | Higashihiroshima, Hiroshima, Japan |
